The Varian E500 is a trusted medium-current ion implanter, a workhorse for accurate semiconductor doping that delivers outstanding value for mature-node fabs. Built with Bernas ion source and high-resolution mass analyzer, it supports multiple dopants including boron, phosphorus and arsenic, offering flexible energy tuning to meet well formation, threshold adjustment and poly gate doping requirements.
Boasting precise dose control and superior beam uniformity, this implanter minimizes wafer-to-wafer variation and particle contamination during implantation. Its reliable beam monitoring system performs real-time feedback correction, securing consistent doping profiles across wafers. Equipped with proven electrostatic chuck and cooling platen, it effectively controls wafer heating and prevents thermal damage even under continuous high-throughput production.
Highly recommended for power semiconductors, discrete devices and MEMS manufacturing, this field-proven platform enjoys abundant spare parts and low operational cost. If you plan to expand doping capacity or replace legacy implantation tools, the Varian E500 serves as a cost-effective, production-ready solution with stable uptime and easy fab integration.
Varian E500 Main Specifications
| Manufacturer | Varian Semiconductor Equipment Associates |
|---|---|
| Model | E500 |
| Equipment Type | Medium-Current Ion Implanter |
| Supported Wafer Sizes | 150 mm and 200 mm, according to the available equipment listing |
| Implant Current Class | Medium current |
| Machine Variant | E500 variant and installed upgrade level must be confirmed from the nameplate |
| Energy Range | Depends on whether the machine is a standard, HP, EHP, EHPi or other configured version |
| Ion Source | Installed source design and supported dopant species must be verified |
| Wafer End Station | Wafer size, scanning, tilt and rotation configuration must be confirmed |
| Dose Control | Beam monitoring, Faraday system and calibration status require inspection |
| Control Platform | Controller, workstation, software revision and communication interface vary by system |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
