The Hitachi S-8840 high-precision CD-SEM (Critical Dimension Scanning Electron Microscope) utilizes a high-resolution electron-optical system to capture detailed top-down images of fine patterns and measure their geometric dimensions, enabling precise control over etching and lithography processes. Stable electron beam control and automated process parameter settings ensure consistency and repeatability in CD measurements. Capable of detecting minute pattern deviations and profile anomalies, the system is suitable for routine in-line inspection within cleanroom environments.
Designed to meet the demands of continuous, long-term production, the system offers reliable performance and ease of maintenance. It integrates seamlessly into existing manufacturing workflows, monitoring pattern quality in real-time to safeguard final product yields.
Hitachi S-8840 Main Specifications
| Manufacturer | Hitachi |
|---|---|
| Model | S-8840 |
| Equipment Type | Critical-Dimension Scanning Electron Microscope |
| Supported Wafer Sizes | 150 mm and 200 mm |
| Compatible Wafer Thickness | Approximately 0.4–1.0 mm, according to the available listing |
| Wafer Cassette Capacity | 25 wafers per cassette |
| Published Image Resolution | 5 nm |
| CD Measurement Range | 0.1–10 µm |
| CD Repeatability | 3σ ≤5 nm or ≤±1% |
| SEM Magnification | 1,000× to 150,000× |
| Optical Microscope Magnification | Approximately 110× |
| Wafer Handling | Cassette-to-cassette automatic wafer transfer and alignment |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
