Built for 6-inch wafer lithography, the DNS SCW60A compact coater & developer features a 2C+2D station configuration to support continuous photoresist coating and developing workflows. It handles both standard photoresist and SOG film processing, widely adopted for discrete devices and small-volume pilot manufacturing.
Its compact footprint makes it ideal for cleanrooms with limited floor space. Precision spin control and hotplate temperature regulation deliver consistent photoresist film thickness, while optimized fluid delivery reduces streaks and coating irregularities across wafers.
This streamlined track is designed for simple operation and quick routine servicing. It can be readily integrated with existing exposure tools, delivering stable patterning results for low-to-medium batch production requirements.
DNS SCW60A Main Specifications
| Manufacturer | DNS |
|---|---|
| Model | SCW60A |
| Alternative Listing Name | DNS SCW60 |
| Equipment Type | Wafer Coater and Developer |
| Supported Wafer Size | 6-inch wafers, according to the available listing |
| Listed Process Configuration | 2C and 2D; actual installed arrangement must be confirmed |
| Primary Process | Photoresist coating and developing |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock and configuration confirmation |
