A staple lithography track tool for mature wafer fabrication, the DNS SKW80 integrated coater and developer system streamlines full photoresist processing for 6/8-inch wafers. It unifies coating, baking and developing workflows, delivering consistent pre-exposure and post-exposure treatment for stable lithography patterning.
Built with compact single-block architecture and flexible 1C+2D process configurations, this system supports high-precision photoresist spinning, uniform film laying and accurate pattern developing. Equipped with reliable HMDS treatment and temperature control modules, it eliminates coating defects and pattern distortion, securing excellent within-wafer uniformity.
Its streamlined design cuts unnecessary downtime and simplifies routine servicing. The track can seamlessly slot into existing cleanroom lines to keep photolithography output steady and reduce variability across wafer batches.
DNS SKW80 Main Specifications
| Manufacturer | DNS |
|---|---|
| Model | SKW80 |
| Equipment Type | Wafer Coater and Developer Track System |
| Supported Wafer Sizes | 6-inch and 8-inch wafers, according to the available listing |
| Listed Process Configurations | 1C+2D, 2C or 2D; actual installed modules must be confirmed |
| Primary Process | Photoresist coating and developing |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock and configuration confirmation |
Key Equipment Features
Designed for 150 mm and 200 mm wafer processing
Suitable for photoresist coating and developing steps
Available listings reference coating and developing module combinations
Applicable to semiconductor photolithography process lines
Actual thermal, transfer and chemical supply configuration can vary
