The SCREEN SU-3200 single wafer cleaning system handles 300mm wafer wet processing with impressive throughput and robust process performance. Single-wafer treatment isolates each substrate, avoiding cross-contamination that commonly occurs within batch cleaning workflows.
It removes micro-particles, organics and metallic residues while preserving sensitive patterns and thin films. Flexible recipe compatibility covers FEOL, BEOL and advanced packaging steps. The system maintains steady uptime in continuous operation, cutting defect levels and supporting consistent production output for your wafer fabrication line.
SCREEN SU-3200 Technical Information
| Parameter | Description |
|---|---|
| Manufacturer | SCREEN Semiconductor Solutions |
| Model | SU-3200 |
| Equipment Type | Single wafer wet cleaning system |
| Wafer Size | 300mm |
| Processing Method | Single wafer cleaning, rinsing, and drying |
| Maximum Chamber Configuration | Up to 12 process chambers, depending on configuration |
| Maximum Throughput | Up to 800 wafers per hour, depending on process conditions |
| Wafer Handling | Automatic wafer loading, transfer, processing, and unloading |
| Chemical Supply | Configuration-dependent chemical delivery system |
| Process Control | Programmable cleaning, rinsing, chemical supply, and drying recipes |
| Main Applications | Advanced logic, memory, post-etch, post-strip, and related wafer cleaning processes |
Exact specifications may vary according to the machine production year, hardware configuration, chamber quantity, chemical modules, software version, factory options, and previous application.
The equipment nameplate, configuration list, facility requirements, and current operating condition should be verified before purchase.
