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SEN 10GSD-A-160 High-Current Ion Implanter

Used SEN 10GSD-A-160 high-current ion implanter for 150 mm and 200 mm wafers. Ion source, beam energy, gas system and wafer disk require confirmation.

SEN 10GSD-A-160 High-Current Ion Implanter EQUIPMENT IMAGE
Configuration Review Model and installed options
New / Used Supply Subject to project availability
Global Delivery Destination-based assessment
Technical RFQ Package and process matching

The SEN 10GSD-A-160 is a reliable batch-type high-current ion implanter, a mature workhorse designed for high-dose doping of 150mm and 200mm wafers. It delivers powerful and stable beam current for source/drain doping, polysilicon doping and other high-concentration implant processes, supporting common dopants including boron, phosphorus and arsenic.

With optimized beamline optics and real-time dose monitoring, this implanter achieves superior within-wafer and wafer-to-wafer uniformity. Its batch rotary end station enables precise tilt and twist angle adjustment to reduce channeling effects, while advanced plasma shower technology minimizes particle generation and surface damage, ensuring consistent doping profiles under long continuous production cycles.

Highly recommended for power semiconductor, discrete device and sensor manufacturing. Thanks to its proven robust design, abundant spare parts supply and low maintenance cost, this implanter is an ideal option when you expand high-dose implant capacity or replace legacy equipment, helping your fab maintain high uptime and stable product yield.

SEN 10GSD-A-160 high-current ion implanter

SEN 10GSD-A-160 Main Specifications

ManufacturerSEN / Sumitomo Eaton Nova
Model10GSD-A-160
Equipment TypeHigh-Current Ion Implanter
Supported Wafer Sizes150 mm and 200 mm, according to the available equipment listing
Implant Current ClassHigh current
Implant Energy RangeMust be confirmed from the installed high-voltage and beamline configuration
Ion SourceSource type, source-head components and approved species must be verified
Wafer End StationInstalled disk, cooling and implant-angle configuration must be confirmed
Dose ControlInstalled Faraday, dose controller and calibration status must be inspected
Process GasesGas box, MFCs, safety equipment and dopant lines vary by machine
Control SystemController hardware, operating software and recipe database must be confirmed
ConditionUsed semiconductor equipment
AvailabilitySubject to current stock, inspection and configuration confirmation

SEN 10GSD-A-160 ion implantation beamline

SEN 10GSD-A-160 equipment nameplate