The ASML TWINSCAN AT:1150i stands as the pioneering 193nm ArF immersion scanner, built for advanced lithography research and process validation on 300mm wafers. As ASML’s first immersion prototype platform, it demonstrated how ultra-pure water between lens and wafer enhances numerical aperture, extending 193nm light to pattern finer features beyond dry ArF limits.
Powered by ASML’s patented dual TWINSCAN stage, the system runs exposure and metrology operations in parallel. While one wafer undergoes scanning exposure, the second wafer completes alignment, focus and overlay measurement. This innovative mechanism optimizes throughput while maintaining tight overlay and focus control for delicate nanoscale patterns.
Designed for process development rather than high-volume mass production, this tool was widely deployed in semiconductor research institutes to explore immersion lithography recipes. It laid the technical foundation for subsequent XT-series immersion scanners, enabling fabs to evaluate advanced patterning strategies ahead of full node transition.
ASML AT:1150i Main Specifications
| Manufacturer | ASML |
|---|---|
| Model | TWINSCAN AT:1150i |
| Equipment Type | ArF Immersion Lithography Scanner |
| Exposure Wavelength | 193 nm |
| Numerical Aperture | NA 0.75 |
| Wafer Size | 300 mm |
| Condition | Used Semiconductor Equipment |
| Availability | Subject to current stock and configuration confirmation |
