The ASML TWINSCAN AT:1150i is an early immersion lithography platform that demonstrated how ultra-pure water between the projection lens and wafer could increase numerical aperture, extending 193 nm ArF lithography to finer patterning beyond the limits of dry exposure.
Its dual-stage TWINSCAN architecture allows wafer exposure and metrology operations to run in parallel. While one wafer is being exposed, the other undergoes alignment, focusing and overlay measurement. This approach improves operational efficiency while maintaining precise focus and overlay control for advanced lithography processes.
ASML AT:1150i Main Specifications
| Manufacturer | ASML |
|---|---|
| Model | TWINSCAN AT:1150i |
| Equipment Type | ArF Immersion Lithography Scanner |
| Exposure Wavelength | 193 nm |
| Numerical Aperture | NA 0.75 |
| Wafer Size | 300 mm |
| Condition | Used Semiconductor Equipment |
| Availability | Subject to current stock and configuration confirmation |
