Step height is a key measurement in semiconductor process development, particularly when evaluating deposited films, etched features and surface changes after material removal. The KLA Tencor P-2 captures a surface trace with a contacting stylus, allowing height differences and profile variations to be examined along a defined scan path.
The resulting profile helps engineers compare process results, check film thickness steps and investigate surface geometry on wafers or other precision samples. Measurement range and achievable resolution depend on the instrument configuration and test conditions.
KLA Tencor P-2 Main Specifications
| Manufacturer | KLA-Tencor |
|---|---|
| Model | P-2 |
| Equipment Type | Long-Scan Stylus Surface Profiler |
| Listed Sample Size | 150 mm / 6-inch |
| Maximum Scan Length | Approximately 210 mm |
| Published Scan Speed Range | Approximately 1 µm/s to 25 mm/s |
| High-Resolution Vertical Range | Approximately ±6.5 µm at 1 Å resolution |
| Extended Vertical Range | Approximately ±150 µm at 25 Å resolution |
| Maximum Profile Data | Up to approximately 5,000 data points per scan |
| Accessible Measurement Area | Up to approximately 210 mm diameter without sample repositioning |
| Maximum Sample Weight | Approximately 2.2 kg |
| Primary Measurements | Step height, roughness, waviness and surface profile |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
