The Canon FPA-5500iZ+ is a high-precision i-line optical stepper utilizing 365nm ultraviolet exposure for mature-node semiconductor wafer patterning. Equipped with Canon’s high-performance 4× reduction projection optics, it supports both 200 mm and 300 mm wafer processing and delivers stable imaging performance with a maximum exposure field of 26 mm × 33 mm.
It adopts advanced shot distortion compensation and multi-point alignment technology to maintain tight overlay control across the entire wafer surface. The system features adjustable numerical aperture and intelligent reticle protection, minimizing pattern distortion and particle contamination during continuous exposure cycles. Its optimized wafer transfer mechanism shortens cycle time while preserving photoresist integrity.
This i-line stepper is widely adopted for manufacturing power semiconductors, CMOS image sensors and MEMS devices. It provides reliable patterning for front-end layers and advanced packaging processes, offering excellent cost efficiency and process repeatability for automotive and IoT chip mass production.
