The Canon FPA-3000i4 i-line stepper operates at a 365 nm exposure wavelength and supports photolithography on 6-inch and 8-inch wafers, depending on the installed configuration. Its applications include power semiconductors, discrete devices, MEMS and other processes where established i-line lithography meets patterning requirements.
The projection optics feature a numerical aperture of 0.63, with a 1:5 reduction ratio and a 22 × 22 mm exposure field. Overlay alignment supports multilayer patterning, while the achievable resolution and throughput depend on the process conditions, resist system and wafer configuration.
For fabs evaluating a used Canon FPA-3000i4, key considerations include stage accuracy, alignment performance, optical condition, maintenance records and compatibility with existing coat-and-develop equipment. Spare parts and technical support should be confirmed for the specific machine before purchase.
Canon FPA-3000i4 Specifications
| Manufacturer | Canon |
|---|---|
| Model | FPA-3000i4 |
| Equipment Type | i-Line Lithography Stepper |
| Exposure Wavelength | 365 nm i-Line |
| Resolution | 0.35 μm |
| Projection Reduction Ratio | 5:1 |
| Wafer Size | 8-inch SEMI wafer with orientation flat |
| Wafer Loader | TYPE6-L |
| Reticle Size | 6-inch |
| Reticle Changer | Canon Standard Type |
| Chamber Type | CD-80 |
| Condition | Used Semiconductor Equipment |
| Availability | Subject to current stock and inspection |
