A mature, field-proven i-line stepper built by Canon, the FPA-3000i4 operates at 365nm wavelength for 6-inch and 8-inch wafer lithography. This vintage exposure tool once served mass production of memory chips and remains popular today for power semiconductors, discrete devices and MEMS patterning.
Its 0.63 NA projection lens delivers reliable sub-0.35μm resolution, paired with robust overlay alignment for repeatable multi-layer patterning. The 1:5 reduction optics support a 22×22mm exposure field, balancing shot size and throughput for non-critical lithography layers.
For second-hand fab setups, this platform is a practical pick. Parts supply stays accessible globally, and the mechanical architecture is straightforward for maintenance. It easily pairs with coater/developer tracks to form a complete affordable lithography cell for mature-node manufacturing.
Canon FPA-3000i4 Specifications
| Manufacturer | Canon |
|---|---|
| Model | FPA-3000i4 |
| Equipment Type | i-Line Lithography Stepper |
| Exposure Wavelength | 365 nm i-Line |
| Resolution | 0.35 μm |
| Projection Reduction Ratio | 5:1 |
| Wafer Size | 8-inch SEMI wafer with orientation flat |
| Wafer Loader | TYPE6-L |
| Reticle Size | 6-inch |
| Reticle Changer | Canon Standard Type |
| Chamber Type | CD-80 |
| Condition | Used Semiconductor Equipment |
| Availability | Subject to current stock and inspection |
