Built for high-volume batch thermal processing up to 200mm wafers, the TEL ALPHA 8S is a mature vertical diffusion furnace trusted across many semiconductor fabs. It handles wet/dry oxidation, annealing and LPCVD tasks, covering most thermal steps needed for discrete chips and power device production.
Its vertical tube design saves valuable cleanroom floor space. Multi-zone temperature control paired with precise gas delivery maintains tight thermal uniformity across the full wafer batch, minimizing thickness and doping variation. Wafer boat rotation further improves process consistency.
Thanks to its widespread installed base, spare parts are readily available globally. The system delivers stable long-run performance and flexible process tuning, making it a practical choice when expanding thermal capacity or replacing older horizontal furnace lines.
TEL ALPHA 8S Main Specifications
| Manufacturer | Tokyo Electron Limited |
|---|---|
| Brand | TEL |
| Model | ALPHA 8S |
| Equipment Type | Vertical Batch Diffusion and Thermal Processing Furnace |
| Supported Wafer Sizes | 150 mm and 200 mm wafers, according to the available listing |
| Wafer Processing | Batch thermal processing |
| Published Process Applications | Wet oxidation, dry oxidation, annealing and configuration-dependent LPCVD |
| Actual Process Configuration | Subject to installed furnace tube, gas panel, quartzware and recipe confirmation |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
