The TEL ALPHA 8S Vertical Diffusion Furnace processes semiconductor wafers in batches for high-temperature operations such as thermal oxidation, annealing and diffusion. Its vertical furnace architecture allows multiple wafers to undergo the same thermal cycle within a controlled process environment.
Temperature uniformity across the furnace zone, gas flow control and wafer spacing all influence process consistency. The ALPHA 8S platform was supplied in different configurations, with the installed furnace tube, heater, gas delivery system and control hardware determining the available process recipes.
Before selecting a used TEL ALPHA 8S, confirm the specific process configuration, supported wafer size, furnace tube condition and gas system setup. These details determine whether the machine matches the required oxidation, diffusion or annealing process.
TEL ALPHA 8S Main Specifications
| Manufacturer | Tokyo Electron Limited |
|---|---|
| Brand | TEL |
| Model | ALPHA 8S |
| Equipment Type | Vertical Batch Diffusion and Thermal Processing Furnace |
| Supported Wafer Sizes | 150 mm and 200 mm wafers, according to the available listing |
| Wafer Processing | Batch thermal processing |
| Published Process Applications | Wet oxidation, dry oxidation, annealing and configuration-dependent LPCVD |
| Actual Process Configuration | Subject to installed furnace tube, gas panel, quartzware and recipe confirmation |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
