TEL MARK 8, a proven lithography platform from TEL, combines coating and developing capabilities for 200mm wafer photoresist workflows. Photoresist coating, thermal baking and post-exposure development run within one continuous sequence to carry out patterning at mature process nodes.
Its modular workstation layout opens up ample room for recipe tuning. Precise spin speed and temperature control hold photoresist film thickness steady, while the integrated edge removal function cuts defect formation along wafer edges.
Numerous fabs rely on this platform to sustain consistent daily throughput. Well-established mechanical architecture curbs unplanned downtime, making it a solid pick when ramping up lithography capacity.
TEL MARK 8 Main Specifications
| Manufacturer | Tokyo Electron Limited |
|---|---|
| Brand | TEL |
| Model | MARK 8 |
| Equipment Type | Wafer Coater and Developer Track System |
| Supported Wafer Sizes | 6-inch and 8-inch wafers, according to the available listing |
| Listed Process Configuration | 2C+2D; actual installed modules must be confirmed |
| Primary Process | Photoresist coating and developing |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock and configuration confirmation |
