The SEMES BLUEICE PRIME 300mm wafer cleaning system offers exceptional temperature uniformity and precise chemical control, excelling particularly in high-temperature phosphoric acid etching and stripping operations. Its unique chuck design minimizes thermal deviation, effectively removing surface contaminants while protecting delicate wafer patterns from damage.
The system supports flexible recipe adjustments for a wide range of wet processes and maintains ultra-low defect rates, even during long-term, high-volume production. Whether you are upgrading existing wet processing equipment or expanding production capacity, this system is a reliable choice for enhancing wafer yield.
Contact us today to discuss your wet cleaning requirements and receive a competitive quote.
SEMES BLUEICE PRIME Technical Specifications
| Parameter | Description |
|---|---|
| Equipment Type | Single wafer cleaning system |
| Manufacturer | SEMES |
| Model | BLUEICE PRIME |
| Wafer Size | 300mm |
| Process Type | Wet wafer cleaning |
| Main Application | Logic and memory semiconductor manufacturing |
| Cleaning Technology | High temperature phosphoric acid cleaning |
| Target | Particles, residues, surface contamination |